However, forming voltage larger than 5 V is required, and there is room to improve the operation voltage which is higher than 2 V. In this work, a novel 1D1R cell structure based on TaN/ZrTiO x /Ni/n+-Si was proposed where TaN/ZrTiO x /Ni was employed as the resistive switching element and Ni/n+-Si played the role of Schottky diode. The reason to adopt ZrTiO x is that it has been shown to have desirable RRAM characteristics [19]. Compared to those published in the literature, the intriguing points of this work lie in four aspects: (1) This is the

first structure that uses metal/semiconductor Schottky diodes to rectify current characteristics and the whole structure requires only four Mdivi1 research buy layers which are much simpler than other 1D1R structures and even comparable Selleckchem S63845 to self-rectifying devices. (2) This 1D1R cell displays desirable electrical characteristics

in terms of forming-free property, R HRS/R LRS ratio higher PCI-34051 than 103, F/R ratio larger than 103, operation voltage close to 1 V, negligible resistance change up to 104 s retention time at 125°C, and robust endurance of 105 cycles. (3) Unlike some 1D1R structures that use special materials as diode, all the layers used in this work are fab-friendly and can be fully integrated with existing ULSI process. Methods N-type Si wafer with doping concentration of 2 × 1017 cm−3 was used as the starting material for 1D1R cell fabrication. A 35-nm Ni was initially deposited on the Si wafer as the bottom electrode of MIM-based RRAM device. Note that the Ni layer on the n-type Si substrate also formed the Schottky diode because of the metal/semiconductor junction. Next, a 10-nm oxygen-deficient ZrTiO x film was deposited by e-beam evaporation from a pre-mixed source that contains ZrO2 and Ti at room temperature as the resistance switching dielectric. TaN of 35 nm was then deposited and patterned by shadow mask as the top electrode. Finally, complete 1D1R cells with the structure of TaN/ZrTiO x /Ni/n+-Si were formed. For electrical characterization, voltage was applied on the the top electrode with the grounded Si substrate.

Separate RRAM (TaN/ZrTiO x /Ni) and Schottky diode (Ni/n+-Si) were also formed to evaluate the behavior of single device. Note that single RRAM devices were fabricated on SiO2 rather than Si substrate for better isolation so that pure RRAM performance can be measured. All the electrical data were measured by devices with the area of 250 μm × 250 μm. In addition to electrical analysis, transmission electron microscopy (TEM) and x-ray diffraction (XRD) were respectively used to characterize the interface property between Ni/n+-Si and to study the crystallinity of the switching dielectric ZrTiO x . Results and discussion Physical analysis of 1D and 1R structure Figure 1 shows the XRD spectrum for ZrTiO x film prior to the deposition of top electrode TaN. No diffraction peaks are observed and it implies that the film is amorphous phase.